Anda VP100 Offline Vacuum Plasma cleaning machine

Chamber Size：L 470 × W 460 × H 470 mm
Electrode Plate Size：L 380 x W 440 mm
Working Vacuum：10-100 Pa
Vacuum Evacuation Time：≤ 25 s

BASIC INFO

Anda VP100 Offline Vacuum Plasma cleaning machine

VP Series are offline standalone (batch style) plasma treatment units designed for immersive vacuum plasma treatment and activation of a materials surface energy. During this process, materials being treated are completely engulfed within a plasma environment allowing all surface areas of complex parts and materials to be treated and activated simultaneously.

In the electronics industry, we highly recommend plasma treatment prior to selective conformal coating or dispensing processes in order to improve wetting of coatings and the adhesion strengths of coatings and other dispensed materials. When materials are plasma treated, coatings and adhesives are significantly less susceptible to fail. Plasma treatment to electronics ensures maximum protection from coatings and glues and a long product life for the intended device.

Features

- Adjustable Shelves: allow processing of a wide variety of part geometrics

- Batch Style: each unit is complete self-contained, requiring minimal floor space

- Ultra-low Temperature: system operation temperature as low as 40°C

- Omni-directional: complete immersion of the treated material by anisotropic plasma

- Environmentally Friendly: zero chemicals are used and no harmful substances are produced

- Cleaning: remove fine dust, oil, grease and organic compounds

- Activation: Increase surface energy to promote wetting and adhesion

VP-100 Specifications

Plasma Treatment Configuration
Chamber Size	L 470 × W 460 × H 470 mm (L 18.50″ x W 18.11″ x H 18.50″)
Electrode Plate Structure	Horizontal 8 Layers
Electrode Plate Size	L 380 x W 440 mm (L 14.96″ x W 17.32″)
Vacuum Pump	Two-stage Rotary Plate Vacuum Pump / Roots Vacuum Pump
Vacuum Measurement	Pilani Resistance Vacuum Gauge
Working Vacuum	10-100 Pa
Vacuum Time	≤ 80 s
Vacuum Evacuation Time	≤ 25 s
Gas Control Range	0-300 SCCM
Gas Flow Sensor	High Precision Mass Flow Meter
Plasma Generator	500 W
RF Power Supply	0-500 W (adjustable range)
Automatic RF Matching	500 W
Facility
Standard Footprint	L 1200 x W 920 x H 1690 mm (L 47.24″ x W 36.22″ x H 66.54″)
Weight	630 kg
Power	3 Phase 380 VAC (Standard), 208/480 VAC with transformer (Optional)
Rated Power	4.0 kW
Gas Generator	Two working gases are optional (Ar,N2,O2,CF4,CDA)
Pressure	0.6 Mpa
Interface
Controller	PLC Controller with Touch Panel